Research Engineer in Nano-lithography - Hiring in process/Finished, not possible to apply

Subject description

The Division of Solid-State Physics, is now seeking a Research Engineer who will be responsible for conducting a process development project within nanoimprint (NIL) and block-copolymer (BCP) nano-lithography and their applications. This project will mostly involve experimental work using the Lund Nano Lab (LNL) facilities with a focus on high-resolution pattern transfer from lithographically-defined patterns to a semiconductor substrate.

One of the main aims of the research is to develop and apply novel methods of selective modification of polymer masks by e.g. ALD-based sequential infiltration synthesis, metal ion loading or other techniques to reach sub-10 nm resolution in patterning. Possible applications of those methods may include fabrication technology of ultra high-resolution nanoimprint stamps or growth of III-V semiconductor nanowires for electronics and photonics applications.

The project will be performed in close collaboration with other researchers, both within and outside the Division of Solid-State Physics and NanoLund.

Work duties

The responsibilities will include:

• An experimental work to investigate and develop ultra high-resolution approaches to selectively modify BCP- or NIL-defined masks for pattern transfer. This work will include such techniques as dry etching, ALD, evaporation, chemical treatment and electroplating.
• Epitaxial growth of nanowires and other structures using the high-resolution template samples.
• Characterisation of the obtained nano-structures, in collaboration with other research groups, when required.
• Analysis of the obtained results, regular presentations and writing up manuscripts and reports.

Qualification requirements

Applicants must have:

• A PhD or equivalent research qualification in physics or equivalent with focus on nanofabrication methods
• Very good oral and written proficiency in English
• Extensive hands-on experience in lithographic techniques, including nanoimprint, optical lithography and electron beam lithography
• Practical skills to use metalorganic vapor phase epitaxy, PECVD, atomic layer deposition, dry etching, thermal evaporation and metal electroplating
• A license to work in the LNL cleanroom
• Licenses to operate the following equipment in LNL: nanoimprint, electron beam lithography, atomic layer deposition, PECVD, ICP-RIE, SEM, ellipsometry
• Excellent communication skills and team-oriented approach

Assessment criteria and other qualifications

For appointments to a Research Engineer position, the following shall form the assessment criteria:

• Hands-on experience with semiconductor process development
• A good ability to plan, develop and conduct high quality research

Additional assessment criteria:

• Experience with block-copolymer lithography
• Experience with TEM characterisation and sample preparation

Consideration will also be given to good collaborative skills, drive and independence, and how the applicant’s experience and skills complement and strengthen ongoing research within the department, and how they stand to contribute to its future development.

Terms of employment

Fixed-term employment, 1 year 6 months, 100 %, temporary position.

Instructions on how to apply

Applications shall be written in English and be compiled into a PDF-file containing:

• résumé/CV, including a list of publications,
• a general description of past research and future research interests (no more than three pages),
• contact information of at least two references,
• copy of the doctoral degree certificate, and other certificates/grades that you wish to be considered.